Method for rapid optimization of FEBID/FIBID processes

Localized conducting nanostructure fabrication by bottom-up approaches, such as focused electron or ion beam induced deposition (FEBID/ FIBID) or selective-area atomic layer deposition (SA-ALD), are more and more frequently used in different application fields. Researchers from the Goethe University Frankfurt am Main have developed a semi-automatic electrical conduction optimization process for these bottom-up techniques. The process is fully customizable, highly efficient and fast.

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